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Hiroki Ueda, Teruo Kanki, and Hidekazu Tanaka
We manipulated the metal-insulator transition characteristics of VO2 thin films on TiO2 (001) substrates by changing their micro-scaled metallic domain configurations through size- and aspect ratio-control. A very steep resistance drop at 294 K was demonstrated for a 1D parallel domain configurati ... [Appl. Phys. Lett. 102, 153106 (2013)] published Thu Apr 18, 2013.
Link to full article
Hiroki Ueda, Teruo Kanki, and Hidekazu Tanaka
We manipulated the metal-insulator transition characteristics of VO2 thin films on TiO2 (001) substrates by changing their micro-scaled metallic domain configurations through size- and aspect ratio-control. A very steep resistance drop at 294 K was demonstrated for a 1D parallel domain configurati ... [Appl. Phys. Lett. 102, 153106 (2013)] published Thu Apr 18, 2013.
Link to full article
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